A transparent boron-nitrogen thin film formed by plasma CVD out of the discharge region

Journal Article · Sat Dec 01 04:00:00 EST 1984 · Plasma Chem. Plasma Process.; (United States)

DOI:https://doi.org/10.1007/BF00568979· OSTI ID:5351028

Montasser, K; Hattori, S; Morita, S; Tamano, J

A transparent boron-nitrogen thin film of thickness 550 nm was successfully deposited out of the discharge region by rf plasma CVD. The deposition was performed with diborane (4.8vol % in N/sub 2/) as the reactant gas and argon as the carrier gas by an inductively coupled reactor at a frequency of 13.56 MHz. The transparant films could be obtained at a low presure of about 30 Pa, at a discharge power level of 30 W, and at room temperature without heating the substrate. The thin film obtained by rf plasma are compared with those obtained by microwave plasma. Both the refractive index and the deposition rate for the films deposited by microwave plasma are discussed according to the deposition conditions.

• Research Organization: Nagoya Univ., Nagoya
• OSTI ID: 5351028
• Journal Information: Plasma Chem. Plasma Process.; (United States), Journal Name: Plasma Chem. Plasma Process.; (United States) Vol. 4:4; ISSN PCPPD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400301 -- Organic Chemistry-- Chemical & Physicochemical Properties-- (-1987)
ABSORPTION SPECTRA
ARGON IONS
BORANES
BORON
BORON COMPOUNDS
BORON NITRIDES
CHARGED PARTICLES
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
COATINGS
DEPOSITION
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
ELEMENTS
FILMS
HIGH-FREQUENCY DISCHARGES
ION SOURCES
IONIZATION
IONS
KINETICS
MICROWAVE RADIATION
NITRIDES
NITROGEN
NITROGEN COMPOUNDS
NONMETALS
OPACITY
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PNICTIDES
RADIATIONS
RADIOWAVE RADIATION
REACTION KINETICS
REFRACTIVITY
SEMIMETALS
SPECTRA
SURFACE COATING
THIN FILMS
VAPOR DEPOSITED COATINGS