Design and verification of nearly ideal flow and heat transfer in a rotating disk chemical vapor deposition reactor

Journal Article · Sat Jun 01 00:00:00 EDT 1991 · Journal of the Electrochemical Society; (United States)

DOI:https://doi.org/10.1149/1.2085878· OSTI ID:5332243

Breiland, W G ^[1]; Evans, G H ^[2]

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1. Sandia National Labs., Albuquerque, NM (United States)
2. Sandia National Labs., Livermore, CA (United States)

A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated-disk conditions, and gas temperatures are addressed with both one- and two-dimensional numerical fluid mechanics models. In this paper experimental verification of the design using flow visualization and laser Raman thermometry are presented.

• DOE Contract Number: AC04-76DP00789
• OSTI ID: 5332243
• Journal Information: Journal of the Electrochemical Society; (United States), Vol. 138:6; ISSN 0013-4651
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
CHEMICAL REACTORS
HEAT TRANSFER
FLUID MECHANICS
ONE-DIMENSIONAL CALCULATIONS
BOUNDARY CONDITIONS
CHEMICAL VAPOR DEPOSITION
DESIGN
EXPERIMENTAL DATA
FLOW VISUALIZATION
HEAT FLOW
RAMAN SPECTROSCOPY
TEMPERATURE MEASUREMENT
TWO-DIMENSIONAL CALCULATIONS
CHEMICAL COATING
DATA
DEPOSITION
ENERGY TRANSFER
INFORMATION
LASER SPECTROSCOPY
MECHANICS
NUMERICAL DATA
SPECTROSCOPY
SURFACE COATING
420400* - Engineering- Heat Transfer & Fluid Flow
400102 - Chemical & Spectral Procedures