Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Simulations of Ripple Formation on Ion-Bombarded Solid Surfaces

Journal Article · · Physical Review Letters
; ;  [1]
  1. Department of Physics, University of Helsinki, P.O.Box 9, FIN-00014 Helsinki (Finland)

Ripple formation on amorphous carbon surfaces bombarded by 5keV Ar ions is studied by atomistic simulations. Sputtering is treated in detail by simulating the entire collision cascades originated by the bombarding Ar ions. Surface relaxation is described by a Wolf-Villain-type discrete model. Ripples and wavelike patterns are observed to emerge on the surface. The ripples have a well-defined wavelength and the orientation of the wave crests changes from normal to parallel to the beam, when the angle of incidence is increased from 30{degree} to 60{degree}, respectively. The wavelength is found to depend on the magnitude of the diffusion and orientation of the beam as predicted by the continuum theories. {copyright} {ital 1997} {ital The American Physical Society}

OSTI ID:
532628
Journal Information:
Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 13 Vol. 78; ISSN 0031-9007; ISSN PRLTAO
Country of Publication:
United States
Language:
English

Similar Records

Kinetic Monte Carlo simulations of ion-induced ripple formation: Dependence on flux, temperature, and defect concentration in the linear regime
Journal Article · Thu Nov 30 23:00:00 EST 2006 · Physical Review. B, Condensed Matter and Materials Physics · OSTI ID:20853957

Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: Experiment and theory
Journal Article · Wed Dec 14 23:00:00 EST 2005 · Physical Review. B, Condensed Matter and Materials Physics · OSTI ID:20787772

Ripple formation on atomically flat cleaved Si surface with roughness of 0.038 nm rms by low-energy Ar{sup 1+} ion bombardment
Journal Article · Tue Mar 15 00:00:00 EDT 2011 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:22051169