An x-ray spectromicroscopic study of the local structure of patterned titanium silicide
- Center for X-ray Lithography, University of Wisconsin-Madison, Stoughton, Wisconsin 53589 (United States)
- Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
- IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120 (United States)
Results from a spectromicroscopic study of the formation of TiSi{sub 2} in patterned structures are reported. An x-ray spectromicroscope was used to acquire spectra and images with photoabsorption signals using synchrotron radiation. A patterned TiSi{sub 2} sample with feature sizes ranging from 100 {mu}m to 0.1 {mu}m was studied. The silicidation reactions were carried out in ultrahigh vacuum using rapid thermal processing. Lateral variations in the local chemistry of the titanium silicide could be directly imaged and are attributed to the formation of the C54 phase in large areas and the C49 phase at feature edges and in narrow features. {copyright} {ital 1997 American Institute of Physics.}
- Research Organization:
- Lawrence Berkeley National Laboratory
- DOE Contract Number:
- AC03-76SF00098; FG02-96ER45569
- OSTI ID:
- 531703
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 1 Vol. 71; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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