{ital In} {ital situ} x-ray diffraction analysis of the C49--C54 titanium silicide phase transformation in narrow lines

Journal Article · Mon Apr 03 04:00:00 EDT 1995 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.113349· OSTI ID:26028

Roy, R A; Clevenger, L A; Cabral, C Jr; Saenger, K L; Brauer, S; Jordan-Sweet, J; Bucchignano, J; Stephenson, G B ^[1]; Morales, G; Ludwig, Jr, K F ^[2]

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1. IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598 (United States)
2. Department of Physics, Boston University, Boston, Massachusetts 02215 (United States)

The transformation of titanium silicide from the C49 to the C54 structure was studied using x-ray diffraction of samples containing arrays of narrow lines of preformed C49 TiSi{sub 2}. Using a synchrotron x-ray source, diffraction patterns were collected at 1.5--2 {degree}C intervals during sample heating at rates of 3 or 20 {degree}C/s to temperatures of 1000--1100 {degree}C. The results show a monotonic increase in the C54 transition temperature by as much as 180 {degree}C with a decreasing linewidth from 1.0 to 0.1 {mu}m. Also observed is a monotonic increase in (040) preferred orientation of the C54 phase with decreasing linewidth. The results demonstrate the power of {ital in} {ital situ} x-ray diffraction of narrow line arrays as a tool to study finite size effects in thin-film reactions.

• OSTI ID: 26028
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 14 Vol. 66; ISSN 0003-6951; ISSN APPLAB
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
66 PHYSICS
ANNEALING
CRYSTAL STRUCTURE
CRYSTAL-PHASE TRANSFORMATIONS
MORPHOLOGY
SYNCHROTRON RADIATION
TEMPERATURE DEPENDENCE
TITANIUM SILICIDES
X-RAY DIFFRACTION