{ital In} {ital situ} x-ray diffraction analysis of the C49--C54 titanium silicide phase transformation in narrow lines
- IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598 (United States)
- Department of Physics, Boston University, Boston, Massachusetts 02215 (United States)
The transformation of titanium silicide from the C49 to the C54 structure was studied using x-ray diffraction of samples containing arrays of narrow lines of preformed C49 TiSi{sub 2}. Using a synchrotron x-ray source, diffraction patterns were collected at 1.5--2 {degree}C intervals during sample heating at rates of 3 or 20 {degree}C/s to temperatures of 1000--1100 {degree}C. The results show a monotonic increase in the C54 transition temperature by as much as 180 {degree}C with a decreasing linewidth from 1.0 to 0.1 {mu}m. Also observed is a monotonic increase in (040) preferred orientation of the C54 phase with decreasing linewidth. The results demonstrate the power of {ital in} {ital situ} x-ray diffraction of narrow line arrays as a tool to study finite size effects in thin-film reactions.
- OSTI ID:
- 26028
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 14 Vol. 66; ISSN 0003-6951; ISSN APPLAB
- Country of Publication:
- United States
- Language:
- English
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