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Title: Preparation of conducting and transparent thin films of tin-doped indium oxide by magnetron sputtering

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.91829· OSTI ID:5315363

High-quality 800-A-thick films of tin-doped indium oxide have been prepared by magnetron sputtering. It is shown that films with low resistivity (approx.4 x 10/sup -4/ ..cap omega.. cm) and high optical transmission (>85% between 4000 and 8000 A) can be prepared on low-temperature (40--180 /sup 0/C) substrates with O/sub 2/ partial pressures of (2--7) x 10/sup -5/ Torr.

Research Organization:
National Research Council of Canada, Ottawa, Canada K1A 0R6
OSTI ID:
5315363
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 37:2
Country of Publication:
United States
Language:
English

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