Carbon-induced amorphous surface layers in Ti-implanted Fe

Journal Article · Fri Aug 01 04:00:00 EDT 1980 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.91893· OSTI ID:5313571

Follstaedt, D M; Knapp, J A; Picraux, S T

Titanium implantation into high-purity Fe is shown to produce a ternary amorphous surface layer consisting of not only Fe and Ti, but also C. The amorphous layer forms at the surface and grows inward with increasing Ti fluence. The amount of C present also increases with Ti fluence and is believed to be deposited on the surface from the vacuum during implantation and to subsequently diffuse into the sample to produce the amorphous layer. For Ti concentrations < or approx. =10 at.%, the amorphous layer thickness is less than the depth of the implanted Ti, but agrees with C diffusion distances, thus demonstrating that C is an essential constituent of the amorphous phase.

• Research Organization: Sandia Laboratories, Albuquerque, New Mexico 87185
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 5313571
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 37:3; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals &amp; Alloys-- Preparation &amp; Fabrication
AMORPHOUS STATE
ATOMIC IONS
CARBON
CHARGED PARTICLES
DATA
DEPOSITION
DIFFUSION
DIFFUSION LENGTH
DIMENSIONS
DOPED MATERIALS
ELEMENTS
INFORMATION
ION IMPLANTATION
IONS
IRON
LAYERS
MATERIALS
METALS
NONMETALS
QUANTITY RATIO
SURFACES
THICKNESS
TITANIUM IONS
TRANSITION ELEMENTS