Absolute photoyield from chemical vapor-deposited diamond and diamond-like carbon films in the UV

Journal Article · Sun Jun 01 00:00:00 EDT 1997 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.119197· OSTI ID:529997

Breskin, A; Chechik, R; Shefer, E; Bacon, D ^[1]; Avigal, Y; Kalish, R ^[2]; Lifshitz, Y ^[3]

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1. The Weizmann Institute of Science, 76100 Rehovot (Israel)
2. Technion, 32000 Haifa (Israel)
3. Soreq NRC, 81800 Yavne (Israel)

The absolute photoyields of chemical vapor deposited (CVD) diamond and amorphous hydrogen-free diamondlike carbon (DLC) films, in the range of 140{endash}300 nm, are reported. CVD diamond films exhibit a large photoyield, of a few percent in the range 140{endash}180 nm. DLC films have a 20{endash}50 times lower yield. Post growth hydrogenation is found to substantially increase the photoyield of CVD diamond films. We discuss the applicability of these films as UV photocathodes coupled to electron multipliers based on gaseous charge multiplication. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 529997
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 25 Vol. 70; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMORPHOUS STATE
CARBON
CHEMICAL VAPOR DEPOSITION
DIAMONDS
HYDROGEN ADDITIONS
PHOTOCATHODES
PHOTOEMISSION
THIN FILMS