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Silicon nitride formation by the carbothermal reduction and ammonolysis of silica

Technical Report ·
OSTI ID:5284871
The production rates of silicon nitride are greater at 1350 and 1400/sup 0/C in the SiO/sub 2/-C-NH/sub 3/ system than in the SiO/sub 2/-C-N/sub 2/ system. When NH/sub 3/ is used as the nitriding gas, silicon nitride appears to be produced through the following overall reactions: 3SiO/sub 2/ + 6C + 4NH/sub 3/ ..-->.. Si/sub 3/N/sub 4/ + 6CO + 6H/sub 2/ and 3SiO/sub 2/ + 4NH/sub 3/ ..-->.. Si/sub 3/N/sub 4/ + 6H/sub 2/O. The following reactions appear to be taking place in the SiO/sub 2/-C-NH/sub 3/ system: SiO/sub 2/ + C ..-->.. SiO + CO; SiO/sub 2/ + CO ..-->.. SiO + CO/sub 2/; SiO/sub 2/ + H/sub 2/ ..-->.. SiO + H/sub 2/O; CO/sub 2/ + C ..-->.. 2CO; 3SiO + 3C + 4NH/sub 3/ ..-->.. Si/sub 3/N/sub 4/ + 3CO + 6H/sub 2/; 3SiO + 3CO + 4NH/sub 3/ ..-->.. Si/sub 3/N/sub 4/ + 3CO/sub 2/ + 6H/sub 2/; 3SiO/sub 2/ + 4NH/sub 3/ ..-->.. Si/sub 3/N/sub 4/ + 6H/sub 2/O. Increased reactant surface area results in a higher production of silicon nitride for a given time of reaction. Therefore, the first four reactions are the rate-limiting steps in the formation of silicon nitride in the SiO/sub 2/-C-NH/sub 3/ system. The use of NH/sub 3/ appears to result in a higher production of SiO available for reaction to silicon nitride due to the increased reducing capabilities of hydrogen in the gas stream. The best silicon nitride powder produced from the SiO/sub 2/-C-NH/sub 3/ system is high in alpha content, low in carbon and oxygen levels, and exhibits a uniform particle shape and size on the order of two microns.
Research Organization:
Ames Lab., IA (USA)
DOE Contract Number:
W-7405-ENG-82
OSTI ID:
5284871
Report Number(s):
IS-T-1274; ON: DE86015771
Country of Publication:
United States
Language:
English