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Title: Compensated amorphous silicon solar cell

Patent ·
OSTI ID:5281892

An amorphous silicon solar cell is disclosed including an electrically conductive substrate, a layer of glow discharge deposited hydrogenated amorphous silicon over said substrate and having regions of differing conductivity with at least one region of intrinsic hydrogenated amorphous silicon. The layer of hydrogenated amorphous silicon has opposed first and second major surfaces where the first major surface contacts the electrically conductive substrate and an electrode for electrically contacting the second major surface. The intrinsic hydrogenated amorphous silicon region is deposited in a glow discharge with an atmosphere which includes not less than about 0.02 atom percent mono-atomic boron. An improved N.I.P. solar cell is disclosed using a BF/sub 3/ doped intrinsic layer.

Assignee:
Dept. of Energy
Patent Number(s):
US 4409424
OSTI ID:
5281892
Resource Relation:
Patent File Date: Filed date 21 Jun 1981; Other Information: PAT-APPL-390730
Country of Publication:
United States
Language:
English