Anodic film formation on a sputter-deposited amorphous Al{endash}40 at.{percent} Sm alloy
Journal Article
·
· Journal of Materials Research
- Corrosion and Protection Centre, University of Manchester Institute of Science and Technology, P.O. Box 88, Manchester (England)
- Department of Chemistry, Keio University, 3-1-14, Hiyoshi, Yokohama 223 (Japan)
The mechanism of ionic transport in the amorphous anodic film formed on Al{endash}40 at.{percent} Sm alloy has been examined by transmission electron microscopy and Rutherford backscattering spectroscopy. The film consists of an outer layer, about 6{percent} of the total film thickness, composed of relatively pure Sm{sub 2}O{sub 3} and an inner layer containing units of Al{sub 2}O{sub 3} and Sm{sub 2}O{sub 3} distributed homogeneously at the available resolution. The anodic film material is formed by migration of O{sup 2{minus}}/OH{sup {minus}} ions inwards and migration of cations outward, with a cation transport number about 0.29. The two-layered film develops as a consequence of faster migration of Sm{sup 3+} ions than Al{sup 3+} ions in the film. {copyright} {ital 1997 Materials Research Society.}
- OSTI ID:
- 528009
- Journal Information:
- Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 7 Vol. 12; ISSN JMREEE; ISSN 0884-2914
- Country of Publication:
- United States
- Language:
- English
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