Photochemical depassivation of hydrogenated (100) nitrogen surface of cubic boron nitride

Journal Article · Tue Jul 01 00:00:00 EDT 1997 · Journal of Materials Research

DOI:https://doi.org/10.1557/JMR.1997.0228· OSTI ID:527999

Komatsu, S ^[1]

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1. National Institute for Research in Inorganic Materials, 1-1 Namiki, Tsukuba, Ibaraki 305 (Japan)

The passivation of nitrogen top-layered (100) surface of cBN by hydrogen was theoretically predicted to be related to the difficulty of chemical vapor deposition of cubic boron nitride recently. The possibility of photochemical depassivation of this surface was suggested by the anti-bonding nature of the surface H-N bonds at the lowest unoccupied molecular orbital; that was demonstrated by AM1 molecular orbital calculations using large cBN clusters such as B{sub 30}N{sub 32}H{sub 64}{sup (2+)} and B{sub 30}N{sub 32}H{sub 62}(2BH {sub 3}). {copyright} {ital 1997 Materials Research Society.}

• OSTI ID: 527999
• Journal Information: Journal of Materials Research, Vol. 12, Issue 7; Other Information: PBD: Jul 1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BORON NITRIDES
SURFACE PROPERTIES
SURFACE TREATMENTS
HYDROGEN ADDITIONS
CHEMICAL VAPOR DEPOSITION
PHOTOCHEMISTRY
ELECTRONIC STRUCTURE
CHEMICAL BONDS
MOLECULAR ORBITAL METHOD
CUBIC LATTICES