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Cubic boron nitride formation on Si (100) substrates at room temperature by pulsed laser deposition

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.108179· OSTI ID:7203676
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  1. Sandia National Laboratories, Livermore, California 94551 (United States)

We are studying the boron nitride system by using a pulsed excimer laser to ablate from hexagonal BN(hBN) targets to form BN films. We have deposited BN films on heated (600 {degree}C) and room-temperature silicon (100) surface in an ambient background gas of N{sub 2}. Fourier transform infrared (FTIR) reflection spectroscopy indicates that the films grown at high temperature have short-range {ital sp}{sup 2} (hexagonal-like) order, whereas films grown at room temperature are a mixture of {ital sp}{sup 3}-bonded BN and {ital sp}{sup 2}-bonded BN. Electron diffraction confirms the presence of cubic BN (cBN) material in the films grown at low temperature and the corresponding TEM lattice images show a grain size of {similar to}200 A. The presence of cBN in the films correlates with laser energy density, with cubic material appearing around 2.4 mJ/cm{sup 2}. Auger electron spectroscopy (AES) indicates that the films are nitrogen deficient.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
7203676
Journal Information:
Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 61:20; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English