Quantitative analysis of phosphosilicate glass films on silicon wafers

Technical Report · Thu Apr 01 04:00:00 EST 1982

OSTI ID:5262740

Weissman, S H; Hallett, S G

We determined the phosphorus and silicon content of 6000 to 10,000A phosphosilicate glass films deposited on 5 cm diameter <100> silicon wafers. The thin film was removed from the wafer by etching with dilute hydrofluoric acid, and the P and Si content of the solution was determined by inductively coupled plasma - atomic emission spectroscopy (ICP). The glass films had 86 to 530 ..mu..g P and 920 to 1700 ..mu..g Si. Assuming these two elements were in the film as P/sub 2/O/sub 5/ and SiO/sub 2/, the calculated weight percent of phosphorus in the film ranged from 2.2 to 12 wt % with an estimated uncertainty of 2.73 to 10.1 relative percent. These analyses will be used to determine the composition of standards which were prepared simultaneously with these samples. Results will aid in control of one step in a microcircuit fabrication process involving chemical vapor deposition of phosphosilicate glass on silicon wafers by determination of the P content per unit area for control samples using a Kevex x-ray fluorescence spectrometer.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 5262740
• Report Number(s): SAND-82-0039; ON: DE82017642
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400104* -- Spectral Procedures-- (-1987)
CALIBRATION STANDARDS
CHALCOGENIDES
CHEMICAL ANALYSIS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
DATA
DEPOSITION
ELEMENTS
EMISSION SPECTROSCOPY
ERRORS
ETCHING
EXPERIMENTAL DATA
FILMS
FLUORESCENCE SPECTROSCOPY
GLASS
HYDROFLUORIC ACID
HYDROGEN COMPOUNDS
INFORMATION
INORGANIC ACIDS
MINERALS
NONMETALS
NUMERICAL DATA
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHOSPHATE GLASS
PHOSPHORUS
PHOSPHORUS COMPOUNDS
PHOSPHORUS OXIDES
PLASMA
QUANTITATIVE CHEMICAL ANALYSIS
SEMIMETALS
SILICA
SILICON
SILICON COMPOUNDS
SILICON OXIDES
SPECTROSCOPY
STANDARDS
SURFACE COATING
SURFACE FINISHING
VAPOR DEPOSITED COATINGS