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Electron attachment rate constants of HBr, CH/sub 3/Br, and C/sub 2/H/sub 5/Br in N/sub 2/ and Ar

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.340431· OSTI ID:5228454
The electron attachment rate constants of bromine compounds in the buffer gases of N/sub 2/ and Ar (approx.250 Torr) were measured as a function of E/N (or mean electron energy). The measured electron attachment rate constants of HBr, CH/sub 3/Br, and C/sub 2/H/sub 5/Br show maximum values of 1.05 x 10/sup -9/, 1.08 x 10/sup -11/, and 9.3 x 10/sup -11/ cm/sup 3//s at mean electron energies of 0.55, 0.4, and 0.8 eV, respectively. The electron drift velocities for the gas mixtures of CH/sub 3/Br in N/sub 2/ and Ar were also measured.
Research Organization:
Department of Electrical and Computer Engineering, San Diego State University, San Diego, California 92182
OSTI ID:
5228454
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 63:10; ISSN JAPIA
Country of Publication:
United States
Language:
English