Microwave absorption at the fundamental electron cyclotron resonance and potential formation in a tandem mirror

Journal Article · Wed Jun 01 04:00:00 EDT 1988 · Phys. Fluids; (United States)

DOI:https://doi.org/10.1063/1.866675· OSTI ID:5223341

Kariya, T; Saito, T; Kiwamoto, Y; Cho, T; Sugawara, H; Kondoh, T; Mase, A; Itakura, A; Miyoshi, S

Strong one-pass absorption of high-power microwaves is observed at the fundamental electron cyclotron resonance in an axisymmetric end mirror of the GAMMA 10 tandem mirror (Phys. Rev. Lett. 55, 939 (1985); Phys. Fluids 29, 2781 (1986)). The radial profile of microwave power deposition is directly measured without the influence of wall reflection. It coincides with that of the axial flow of warm electrons driven by the fundamental heating as well as with that of the plasma potential at the resonance. This indicates that strong electron cyclotron heating largely affects the potential formation through driving an axial flow of warm electrons.

• Research Organization: Plasma Research Center, University of Tsukuba, Sakuramura, Niiharigun Ibaraki 305, Japan
• OSTI ID: 5223341
• Journal Information: Phys. Fluids; (United States), Journal Name: Phys. Fluids; (United States) Vol. 31:6; ISSN PFLDA
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700101* -- Fusion Energy-- Plasma Research-- Confinement
Heating
& Production
ABSORPTION
CYCLOTRON RESONANCE
ECR HEATING
ELECTROMAGNETIC RADIATION
ELECTRONS
ELEMENTARY PARTICLES
ENERGY ABSORPTION
FERMIONS
HEATING
HIGH-FREQUENCY HEATING
LEPTONS
MAGNETIC MIRRORS
MICROWAVE RADIATION
OPEN PLASMA DEVICES
PLASMA
PLASMA DIAGNOSTICS
PLASMA HEATING
POTENTIALS
POWER
RADIATIONS
RESONANCE
TANDEM MIRRORS
THERMONUCLEAR DEVICES