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Effects of sputtering through small apertures on the refractive index of niobium pentoxide films

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.575284· OSTI ID:5220912

Niobium pentoxide (Nb/sub 2/O/sub 5/) can be reactively rf sputtered to produce high-index low-loss amorphous films for use as integrated optical (IO) components. Tight tolerances are required on refractive index, loss, scatter, and geometric form. Of particular interest to IO devices are thin-film Luneburg lenses which have been successfully employed on lithium niobate (LiNbO/sub 3/) based acousto-optic spectrum analyzers. To develop a particular lens configuration it is necessary to sputter through a circular aperture mask in contact with the LiNbO/sub 3/. Experimental evidence has shown that there is a significant drop in refractive index under fixed deposition conditions as the ratio of aperture diameter to mask thickness A/t is decreased. For an A/t ratio of 7.0 the index is 2.272 while an A/t ratio of 1.0 results in an index of 2.224. Increasing the power to the Nb target and bias sputtering have been successfully applied to raise the index. An increase in power from 70 to 400 W raised lens indices from 2.220 to 2.280. Bias sputtering similarly increases lens indices but distorted the lens profile. The mechanisms influencing refractive index change in amorphous Nb/sub 2/O/sub 5/ films sputtered under varying deposition conditions are discussed.

Research Organization:
Motorola Inc., Government Electronics Group, Scottsdale, Arizona 85252
OSTI ID:
5220912
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:3; ISSN JVTAD
Country of Publication:
United States
Language:
English

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