Characterization on RF magnetron sputtered niobium pentoxide thin films
- Department of Physics, Alagappa University, Karaikudi - 630 004 (India)
- Department of Physics, Alagappa Chettiar College of Engineering and Technology, Karaikudi - 630 004 (India)
Niobium pentoxide (Nb{sub 2}O{sub 5}) thin films with amorphous nature were deposited on microscopic glass substrates at 100°C by rf magnetron sputtering technique. The effect of rf power on the structural, morphological, optical, and vibrational properties of Nb{sub 2}O{sub 5} films have been investigated. Optical study shows the maximum average transmittance of about 87% and the optical energy band gap (indirect allowed) changes between 3.70 eV and 3.47 eV. AFM result indicates the smooth surface nature of the samples. Photoluminescence measurement showed the better optical quality of the deposited films. Raman spectra show the LO-TO splitting of Nb-O stretching of Nb{sub 2}O{sub 5} films.
- OSTI ID:
- 22308015
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1620; ISSN 0094-243X; ISSN APCPCS
- Country of Publication:
- United States
- Language:
- English
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