Electron-sensitive resists. II. Positive resists derived from high polymers of methyl methacrylate, methyl. cap alpha. -chloroacrylate, and hexyl methacrylate. [Electron beam irradiation]

Journal Article · Sun Jan 01 04:00:00 EST 1978 · J. Appl. Polym. Sci.; (United States)

DOI:https://doi.org/10.1002/app.1978.070220105· OSTI ID:5211195

Lai, J H; Shrawagi, S

This paper reports the synthesis, characterization, and evaluation of copolymers of methyl methacrylate (MMA) and hexyl methacrylate (HMA) and of HMA and methyl ..cap alpha..-chloroacrylate (MCA) and of terpolymers of MMA, MCA, and HMA as electron-sensitive positive resists. The sensitivities of the resists were found to be strongly dependent on the composition. Two of the terpolymers were found to be significantly more sensitive than poly(methyl methacrylate) (PMMA).

• Research Organization: Honeywell Corp. Research Center, Bloomington, MN
• OSTI ID: 5211195
• Journal Information: J. Appl. Polym. Sci.; (United States), Journal Name: J. Appl. Polym. Sci.; (United States) Vol. 22:1; ISSN JAPNA
• Country of Publication: United States
• Language: English

Related Subjects

38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY
400600* -- Radiation Chemistry
BEAMS
CHEMICAL RADIATION EFFECTS
CHEMICAL REACTIONS
CHEMISTRY
COMPARATIVE EVALUATIONS
COPOLYMERS
DECOMPOSITION
ELECTRON BEAMS
ESTERS
LEPTON BEAMS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PARTICLE BEAMS
POLYACRYLATES
POLYMERS
POLYVINYLS
RADIATION CHEMISTRY
RADIATION EFFECTS
RADIOLYSIS
SYNTHESIS