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Annealing effects in tunnel junctions (voltage annealing with alternating polarity)

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.331337· OSTI ID:5190149
This paper describes the time-dependent changes which occur in Al-Al oxide-Pb tunnel junctions as a result of voltage annealing with alternating polarity (AP). By examining changes in junction resistance, barrier parameters (barrier thickness, average barrier height, and the separation between barrier heights at the two electrodes), and inelastic electron tunneling (IET) peak intensities, one finds that some charge within the barrier is fairly mobile under the influence of AP voltage annealing while another portion appears to become trapped. Also, the IET intensity of the 118-meV Al--O stretching peak of the Al oxide was found to increase with decreasing barrier height.
Research Organization:
Department of Physics, University of Alberta, Edmonton, Alberta T6G 2J1, Canada
OSTI ID:
5190149
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:7; ISSN JAPIA
Country of Publication:
United States
Language:
English