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Effect of bias sputtering on magnetic properties and structure of compositionally modulated Tb/sub 32/Fe/sub 68/ films

Conference · · IEEE (Institute of Electrical and Electronics Engineers) Transactions on Magnetics; (USA)
OSTI ID:5180807
;  [1]
  1. Texas Univ., Austin, TX (USA)
Amorphous Tb/sub 32/Fe/sub 68/ compositionally modulated films (CMFs) were prepared in a multi-target rf diode sputtering system. Independent control of the rf voltage ratios of both the Tb and Fe targets allowed the composition of the film to be held constant as the substrate bias was changed. Cross-sectional TEM showed that small scale atomic clusters were aligned in layers. The authors describe how bias sputtering appeared to enhance the magnetic and magneto-optical properties and modified the film structure from a columnar void morphology to a dense, featureless morphology.
OSTI ID:
5180807
Report Number(s):
CONF-890309--
Conference Information:
Journal Name: IEEE (Institute of Electrical and Electronics Engineers) Transactions on Magnetics; (USA) Journal Volume: 25:5
Country of Publication:
United States
Language:
English