Temperature-independent behavior of the Hall constant in granular In sub 2 O sub 3 minus x films

Journal Article · Wed Nov 15 04:00:00 EST 1989 · Physical Review (Section) B: Condensed Matter; (USA)

DOI:https://doi.org/10.1103/PhysRevB.40.10629· OSTI ID:5178442

Nissim, M; Rosenbaum, R L ^[1]

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1. School of Physics and Astronomy, Raymond and Beverly Sackler Faculty of Exact Sciences, Tel-Aviv University, Ramat-Aviv, 69978 Tel-Aviv, Israel (IL)

In insulating, three-dimensional films of granular In{sub 2}O{sub 3{minus}{ital x}}, the resistance behavior is well described by the Mott variable-range-hopping (VRH) expression, {ital R}{proportional to}exp({ital T}{sub Mott}/T){sup 1/4}; this Mott VRH dependence of the resistance is observed in the liquid-helium to liquid-nitrogen temperature regime. In the same temperature interval, the Hall constant {ital R}{sub {ital H}} is observed to be independent of temperature. This result is in conflict with the theoretical prediction of Gruenewald {ital et} {ital al}., where an temperature dependence is anticipated.

• OSTI ID: 5178442
• Journal Information: Physical Review (Section) B: Condensed Matter; (USA), Journal Name: Physical Review (Section) B: Condensed Matter; (USA) Vol. 40:15; ISSN PRBMD; ISSN 0163-1829
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
CHALCOGENIDES
DATA ANALYSIS
ELASTIC SCATTERING
FILMS
GRANULAR MATERIALS
HALL EFFECT
INDIUM COMPOUNDS
INDIUM OXIDES
MATERIALS
MOTT SCATTERING
OXIDES
OXYGEN COMPOUNDS
SCATTERING
TEMPERATURE DEPENDENCE