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Combined microcrystal and amorphous silicon cells

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93515· OSTI ID:5166885

Solar cells have been constructed by depositing a microcrystalline p-silicon layer on an amorphous i-n structure. Here p and n denote the type of dopant and i the intrinsic. The silicon layers are formed by electron beam evaporation and doped through the coevaporation of boron for p type and antimony for n type. After hydrogenation by plasma annealing, solar cells are obtained with an open circuit voltage of 540 mV and short circuit current of 5 mA/cm/sup 2/ under AMl simulated light. The fill factor is 46%.

Research Organization:
Boston College, Chestnut Hill, Massachusetts 02167
OSTI ID:
5166885
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 41:4; ISSN APPLA
Country of Publication:
United States
Language:
English