Surface-selective deposition of palladium and silver films from metal-organic precursors. A novel metal-organic chemical vapor deposition redox transmetalation process
Journal Article
·
· Journal of the American Chemical Society; (United States)
- Univ. of Illinois, Urbana-Champaign, IL (United States)
We report the first surface-selective depositions of Pd and Ag films from metal-organic precursors. We also describe mechanistic studies of this process by in situ kinetic and spectroscopic studies conducted in ultrahigh vacuum. We have studied three precursors containing the hexafluoroacetylacetonato (hfac) ligand: Pd(hfac)[sub 2] (1), Ag(hfac)(PMe[sub 3]) (2), and AF(hfac)(PMe[sub 3])[sub 2] (3). These compounds (especially 1) are reasonably volatile and sublime readily in vacuo at temperatures of 20-50[degree]C. Chemical vapor depositions from these precursors have been conducted at 200-245[degree]C both under vacuum (10[sup [minus]4] Torr) and in the presence of H[sub 2]. In the presence of H[sub 2], Pd(hfac)[sub 2] readily gives micron-thick films of pure palladium metal on glass, silicon, copper, tungsten, aluminum, and nickel at temperatures as low as 200[degrees]C. Mass spectrometic analysis of the byproducts suggests that deposition of Pd involves the reaction of Pd(hfac)[sub 2] with H[sub 2] to form hexafluoroacetylacetone (hfacH). Similar surface-independent depositions of Ag films are observed for the silver precursors under an H[sub 2] atmosphere. This redox transmetalation route may be generally applicable provided that the redox potentials are favorable and that the surface atoms can be carried away as a volatile hfac complex. 33 refs., 1 fig.
- DOE Contract Number:
- FG02-91ER45439
- OSTI ID:
- 5161632
- Journal Information:
- Journal of the American Chemical Society; (United States), Journal Name: Journal of the American Chemical Society; (United States) Vol. 115:24; ISSN JACSAT; ISSN 0002-7863
- Country of Publication:
- United States
- Language:
- English
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Conference
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Thu Dec 30 23:00:00 EST 1993
·
OSTI ID:141049
Aerosol-assisted chemical vapor deposition (AACVD) of binary alloy (Ag{sub x}Pd{sub 1-x}, Cu{sub x}Pd{sub 1-x}, Ag{sub x}Cu{sub 1-x}) films and studies of their compositional variation
Journal Article
·
Tue Aug 01 00:00:00 EDT 1995
· Chemistry of Materials
·
OSTI ID:191879
Mechanistic studies of palladium thin film growth from palladium(II) {beta}-diketonates. 2. Kinetic analysis of the transmetalation reaction of bis(hexafluoroacetylacetonato)palladium(II) on copper surfaces
Journal Article
·
Wed Jun 26 00:00:00 EDT 1996
· Journal of the American Chemical Society
·
OSTI ID:282999
Related Subjects
36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102 -- Chemical & Spectral Procedures
400201 -- Chemical & Physicochemical Properties
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ELEMENTS
FILMS
HYDROGEN
LIGANDS
MASS SPECTROSCOPY
METALS
NONMETALS
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PALLADIUM
PLATINUM METALS
REDOX PROCESS
REPROCESSING
SEPARATION PROCESSES
SILVER
SPECTROSCOPY
SURFACE COATING
THIN FILMS
TRANSITION ELEMENTS
ULTRAHIGH VACUUM
X-RAY SPECTROSCOPY
360101* -- Metals & Alloys-- Preparation & Fabrication
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102 -- Chemical & Spectral Procedures
400201 -- Chemical & Physicochemical Properties
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ELEMENTS
FILMS
HYDROGEN
LIGANDS
MASS SPECTROSCOPY
METALS
NONMETALS
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PALLADIUM
PLATINUM METALS
REDOX PROCESS
REPROCESSING
SEPARATION PROCESSES
SILVER
SPECTROSCOPY
SURFACE COATING
THIN FILMS
TRANSITION ELEMENTS
ULTRAHIGH VACUUM
X-RAY SPECTROSCOPY