Deposition and properties of yttria-stabilized zirconia thin films using reactive direct current magnetron sputtering

Journal Article · Fri Nov 01 04:00:00 EST 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.577172· OSTI ID:5157941

Thiele, E S; Wang, L S; Mason, T O; Barnett, S A ^[1]

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1. Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science Northwestern Univ., Evanston, IL (United States). Materials Research Center

Yttria-stabilized zirconia (YSZ) thin films were deposited by reactive magnetron sputter deposition from a composite Zr--Y target in Ar--O{sub 2} mixtures. Hysteresis was observed as a function of oxygen flow rate {ital f}. For a discharge current of 0.4 A and a total pressure {ital P} of 5 mTorr, for example, the target oxidized at {ital f}{gt}2.3 ml/min, with the reverse transition from an oxidized to a metallic target surface occurring at 1.95 ml/min. The deposition rate was 2.7 {mu}m/h in the metallic mode and 0.1 {mu}m/h in the oxide mode. Fully oxidized (Y{sub 2}O{sub 3}){sub 0.1}(ZrO{sub 2}){sub 0.9} was obtained for {ital f}{gt}2.0 ml/min, even in the metallic mode. While films deposited with {ital P}=3--20 mTorr were continuous, for {ital P}{gt}20 mTorr crazing was apparent as expected for a ceramic film in a tensile stress state. For {ital P}{lt}3 mTorr, the films delaminated due to excessive compressive stress. X-ray diffraction and electron microscopy results showed that the films were polycrystalline cubic YSZ with a columnar structure and an average grain diameter of 15 nm. Fully dense films were obtained at a deposition temperature of 350 {degree}C. Temperature-dependent impedance spectroscopy analysis of YSZ films with Ag electrodes showed that the oxygen ion conductivity was as expected for YSZ.

• OSTI ID: 5157941
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 9:6; ISSN 0734-2101; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
CHALCOGENIDES
CHARGED PARTICLES
CRYSTAL STRUCTURE
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
FILMS
IONIC CONDUCTIVITY
IONS
MAGNETRONS
MICROSTRUCTURE
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXIDES
OXYGEN COMPOUNDS
OXYGEN IONS
PHYSICAL PROPERTIES
SPUTTERING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
YTTRIUM OXIDES
ZIRCONIUM COMPOUNDS
ZIRCONIUM OXIDES