Metallo-organic solution deposition (MOSD) of transparent, crystalline ferroelectric films

Patent · Tue Oct 16 00:00:00 EDT 1990

OSTI ID:5154545

Lipeles, R A; Coleman, D J

This patent describes an improved coating deposition process for transparent, ferroelectric films up to 5 mm thick. It comprises: mixing liquid state metallo-organic starting materials consisting of at least one alkoxide or carboxylic acid salt of the metals selected from a group consisting of barium, strontium, lead, lanthanum or lithium or a from a group consisting of zirconium, titanium or niobium to form a coating solution; spinning, dipping, or spraying the coating solution on the substrate to be coated; drying the coated substance at low temperature in the range of 100-200{degrees}C. in air or a vacuum, thereby removing low boiling solvent molecules; rapidly densifying the coated substrate at moderate temperature (400-600{degrees}C.), thereby forming an amorphous film; repeating the above steps until a desired coating thickness is obtained; and annealing the thus formed film at a temperature in the range 525-800{degrees}C. to obtain a transparent ferroelectric oxide film with a controlled grain size.

• Assignee: Aerospace Corp., El Segundo, CA (USA)
• Patent Number(s): US 4963390; A
• Application Number: PPN: US 7-253538
• OSTI ID: 5154545
• Resource Relation: Patent File Date: 5 Oct 1988
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
FERROELECTRIC MATERIALS
DEPOSITION
ANNEALING
BARIUM
CHEMICAL COMPOSITION
FILMS
NIOBIUM
OPACITY
ORGANOMETALLIC COMPOUNDS
STRONTIUM
WORKING FLUIDS
ZIRCONIUM
ALKALINE EARTH METALS
ELEMENTS
FLUIDS
HEAT TREATMENTS
METALS
OPTICAL PROPERTIES
ORGANIC COMPOUNDS
PHYSICAL PROPERTIES
TRANSITION ELEMENTS
360601* - Other Materials- Preparation & Manufacture