Micropattern measurement with an atomic force microscope

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

DOI:https://doi.org/10.1116/1.585483· OSTI ID:5152015

Fujii, T; Suzuki, M; Miyashita, M; Yamaguchi, M; Onuki, T; Nakamura, H; Matrubara, T ^[1]; Yamada, H; Nakayama, K ^[2]

---

1. Nikon Co., Tokyo (Japan)
2. National Research Lab. of Metrology , Tsukuba (Japan)

The atomic force microscope (AFM) can profile the surfaces of conductors and insulators with nanometer resolution. One of the most promising applications of the AFM is micropattern measurement of semiconductor device parameters such as linewidth. This paper describes an AFM with high precision positioning stages using monolithic, parallel spring mechanisms with flexture hinges applied to the measurement of nonconducting surfaces. The X-Y scanner is equipped with the two-dimensional optical interferometer to measure displacements of the scanner. The sensing lever is a microfabricated V-shaped Si{sub 3}N{sub 4} cantilever with a tip made using electron beam deposition. Distortion-free images of a polycarbonate compact disk nonconducting surfaces with details around the pits have been successfully obtained.

• OSTI ID: 5152015
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Vol. 9:2; ISSN 0734-211X; ISSN JVTBD
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420500 -- Engineering-- Materials Testing
440800* -- Miscellaneous Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
CARBON COMPOUNDS
CARBONATES
DEPOSITION
INTERFEROMETERS
LINE WIDTHS
MATERIALS TESTING
MEASURING INSTRUMENTS
MICROSCOPES
MICROSCOPY
NITRIDES
NITROGEN COMPOUNDS
NONDESTRUCTIVE TESTING
OXYGEN COMPOUNDS
PNICTIDES
POLYCARBONATES
RESOLUTION
SEMICONDUCTOR DEVICES
SILICON COMPOUNDS
SILICON NITRIDES
SPATIAL RESOLUTION
SURFACE COATING
TESTING