Characterization of anodic barrier films on tantalum and 1100 aluminum by ISS/SIMS

Journal Article · Sun Jan 01 04:00:00 EST 1978 · J. Vac. Sci. Technol.; (United States)

DOI:https://doi.org/10.1116/1.569432· OSTI ID:5142598

McCune, R C

Ion scattering spectrometry (ISS) and concurrent secondary ion mass spectrometry (SIMS) were used to determine the depth profiles of anodic barrier oxide films grown on tantalum and type 1100 aluminum. The sputter rate in each case was determined from the film thickness measured by the anodic overvoltage, and the penetration time determined by the decrease in intensity of the metal oxide fragment observed using SIMS. A mixture of helium and neon ions was used to sputter aluminum oxide films in order to observe ion scattering of helium by oxygen, while taking advantage of the higher sputtering rate available with neon. A comparison of sputter rates for helium and neon on tantalum oxide indicated that neon sputtered the film at a rate eight times that of helium. SIMS depth profiling of the residual boron in the anodic aluminum oxide indicated a mixing effect which did not permit adequate resolution of the interface between the oxide film and the underlying metal.

• Research Organization: Engineering and Research Staff, Ford Motor Company, Dearborn, Michigan 48121
• OSTI ID: 5142598
• Journal Information: J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 15:1; ISSN JVSTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALUMINIUM
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ANODIZATION
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL ANALYSIS
CHEMICAL COATING
CORROSION PROTECTION
DEPOSITION
DEPTH DOSE DISTRIBUTIONS
ELECTROCHEMICAL COATING
ELECTROLYSIS
ELEMENTS
FILMS
HELIUM IONS
ION SCATTERING ANALYSIS
IONS
LYSIS
MASS SPECTROSCOPY
METALS
NEON IONS
NONDESTRUCTIVE ANALYSIS
OVERVOLTAGE
OXIDES
OXYGEN COMPOUNDS
RADIATION DOSE DISTRIBUTIONS
REFRACTORY METALS
SPATIAL DOSE DISTRIBUTIONS
SPECTROSCOPY
SPUTTERING
SURFACE COATING
TANTALUM
TANTALUM COMPOUNDS
TANTALUM OXIDES
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS