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Advanced chemical mechanisms for acid deposition modeling

Conference · · Proceedings, Annual Meeting, Air Pollution Control Association; (USA)
OSTI ID:5104659
 [1];  [2]
  1. State Univ. of New York, Albany, NY (USA)
  2. Beijing Univ., BJ (China)
Atmospheric chemistry is of concern to both policy-makers and scientists because atmospheric transformation rates determine the extent to which reductions in the emissions of sulfur and nitrogen oxides will in fact reduce acid deposition. Policy decisions should be based upon solid science, thus a chemical mechanism for a regional acid deposition model must incorporate all significant chemical reactions. The gas-phase chemical mechanism affects the distribution, chemical form and concentration of potentially harmful chemical species because transport lifetimes depend on the chemical form of the trace species; the correct chemical form can be predicted only if a realistic chemical mechanism is employed; and gas-phase chemistry supplies all of the important reactants to cloud water, where the sulfur dioxide conversion rates can be very high. Although a scientifically sound chemical mechanism for a regional acid deposition model (RADM) should include as many details of atmospheric chemistry as possible, the mechanism must be simple by comparison with the very complex chemistry of the real atmosphere. The authors discuss how techniques such as the use of surrogate species or lumping must be used to simplify the organic chemistry in a chemical mechanism to be used in a complex atmospheric transport/transformation model so that the model will only require reasonable computational resources.
OSTI ID:
5104659
Report Number(s):
CONF-870695--
Conference Information:
Journal Name: Proceedings, Annual Meeting, Air Pollution Control Association; (USA) Journal Volume: 4
Country of Publication:
United States
Language:
English