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Chemical mechanisms for the modeling of acid deposition

Conference · · Am. Chem. Soc., Div. Pet. Chem., Prepr.; (United States)
OSTI ID:5432415
An aqueous phase chemistry model has to consider several meteorological variables in addition to chemical species; these include vertical mixing of pollutants, removal through wet deposition, and cloud effects upon photolysis rates. Aqueous and gas phase chemistry mechanisms couple in a complex manner through the effect of clouds on photolysis rates and scavenging of gas phase radicals by droplets. The first versions of the NCAR Regional Acid Deposition Model (RADM) gas phase and aqueous phase chemical mechanisms are being compared with the more comprehensive mechanisms. In view of the high sensitivity of acid generation to the initial aromatic hydrocarbon content of atmospheric mixtures, the highest priority was given to the comparison of the HO, HO/sub 2/, H/sub 2/O/sub 2/ and acid concentrations produced by the condensed RADM gas phase aromatic chemistry model with those predicted by the comprehensive mechanism.
Research Organization:
National Center for Atmospheric Research, P.O. Box 3000, Boulder, CO 80307
OSTI ID:
5432415
Report Number(s):
CONF-860425-
Conference Information:
Journal Name: Am. Chem. Soc., Div. Pet. Chem., Prepr.; (United States) Journal Volume: 31:2
Country of Publication:
United States
Language:
English

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