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Structure and composition of oxidized aluminum on NiO(100)

Journal Article · · Journal of Vacuum Science and Technology, A
DOI:https://doi.org/10.1116/1.580679· OSTI ID:508994
;  [1]
  1. Laboratory for Surface Science and Technology, University of Maine, Orono, Maine 04469-5764 (United States)
Aluminum was deposited on stoichiometric NiO(100) in 5{times}10{sup {minus}6}TorrO{sub 2} at substrate temperatures of 250 and 800{degree}C, and the resulting film interfaces were studied by photoemission [x-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS)] and electron diffraction [reflection high-energy electron diffraction (RHEED)]. At 800{degree}C, RHEED patterns indicate that the growing overlayer interacts with the NiO(100) substrate forming a NiAl{sub 2}O{sub 4} spinel phase. This observation is further supported by XPS and UPS results where peak shapes and relative peak positions correspond to values reported for thick NiAl{sub 2}O{sub 4} films. During film growth at 250{degree}C, the underlying NiO RHEED pattern becomes diffuse due to formation of an amorphous overlayer. XPS and UPS results indicate that the amorphous film is Al{sub 2}O{sub 3} and that little interaction with the NiO substrate occurs. Postdeposition annealing of the amorphous Al{sub 2}O{sub 3} film to 800{degree}C in O{sub 2} results in a strong reaction at the interface and film crystallization to the NiAl{sub 2}O{sub 4} spinel phase. These results demonstrate that kinetic factors are significant in determining interactions in this system. {copyright} {ital 1997 American Vacuum Society.}
DOE Contract Number:
FG02-90ER45417
OSTI ID:
508994
Report Number(s):
CONF-961002--
Journal Information:
Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 3 Vol. 15; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English