Metal overlayers on organic functional groups of self-organized molecular assemblies: VII. Ion scattering spectroscopy and x-ray photoelectron spectroscopy of Cu/CH{sub 3} and Cu/COOCH{sub 3}
- National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)
X-ray photoelectron spectroscopy (XPS) and ion scattering spectroscopy (ISS) were used to characterize octadecanethiol [ODT, HS(CH{sub 2}){sub 17}CH{sub 3}] and methylmercaptohexadecanoate [MMHD, HS(CH{sub 2}){sub 15}COOCH{sub 3}] self-assembled monolayers (SAMs) before and after depositing up to 1.0 nm Cu at ca. 10{sup {minus}7}Torr. Results from XPS O 1s, Cu 2p, and C 1s spectra do not indicate that a complex is formed (no chemical shifts) between Cu and the COOCH{sub 3} of MMHD or ODT organic functional groups (OFG) at 295 K. Although no direct evidence for Cu/COOCH{sub 3} interactions is evident, the initial value for ISS Cu peak intensities for 1.0 nm of Cu on COOCH{sub 3} of MMHD requires 7 h before it disappears compared with less than 150 min for Cu on CH{sub 3} of ODT. These times are also bracketed from XPS results, which are less sensitive than ISS to loss of copper from the M/SAM surface. The longer penetration time through MMHD versus ODT might be explained by weak interactions between Cu and COOCH{sub 3} of MMHD by different defect densities in the SAMs. The actual Cu deposition versus a layer-by-layer growth model and narrowing of the XPS Cu 2p peaks both provide support for formation of Cu clusters on the OFGs prior to penetration to the SAM/Au interface. {copyright} {ital 1997 American Vacuum Society.}
- Research Organization:
- National Renewable Energy Laboratory
- DOE Contract Number:
- AC36-83CH10093
- OSTI ID:
- 508993
- Report Number(s):
- CONF-961002--
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 3 Vol. 15; ISSN JVTAD6; ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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