Interfacial interaction of in situ Cu growth on tetrasulfide self-assembled monolayer on plasma treated parylene surface
Journal Article
·
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
- Center for Integrated Electronics, Rensselaer Polytechnic Institute, 110 8th Street, Troy, New York 12180-3590 and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, 110 8th Street, Troy, New York 12180-3590 (United States)
The interfacial reactions of in situ grown Cu and functionalized parylene surfaces were examined using the x-ray photoelectron spectroscopy (XPS). It is observed that bis[3(triethoxysilane)propyl]tetrasulfide (tetrasulfide) forms a self-assembled monolayer (SAM) only on a parylene surface treated with either He plasma or N{sub 2} plasma, but not on the as-deposited parylene surface due to its lack of functional groups. The functional groups on the plasma treated parylene surface facilitate the formation of tetrasulfide SAM that subsequently improves the reactivity of parylene to Cu. The XPS spectra show a strong shift ({approx}1.1 eV) of the S 2p peaks from a higher binding energy to a lower binding energy, which suggests the existence of an interaction between sulfide and Cu. In addition, the result of a higher XPS intensity ratio of Cu 2p{sub 3/2}/C 1s for Cu growth on tetrasulfide SAM/plasma treated parylene surface than that of an as-deposited parylene surface indicates that the formation of tetrasulfide moiety (-SSSS-) on functionalized parylene surface leads to the increase of Cu growth rate.
- OSTI ID:
- 20853539
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 5 Vol. 24; ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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