Phase formation in Au-Al and Cu-Al thin-film systems under ion beam bombardment

Journal Article · Tue May 01 04:00:00 EDT 1984 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.333369· OSTI ID:5056846

Chang, C T; Campisano, S U; Cannavo, S; Rimini, E

Au-Al and Cu-Al thin film bilayers were bombarded at 80 K with Kr/sup +/ ions of 60--240 keV energy. The Au/sub 2/Al+AuAl/sub 2/ and Al/sub 4/Cu/sub 9/ phases formed during bombardment and they were investigated by backscattering and x-ray diffraction techniques. In all the cases the growth kinetics is linear with the parameter (fluence x interfacial deposited energy density)/sup 1//sup ///sup 2/ suggesting a correlation with a diffusion-like process. Comparison with calculations of diffusion enhanced within the collision cascade gives good agreement with the experimental results.

• Research Organization: Istituto Dipartimentale di Fisica dell'Universita, Corso Italia 57, I95129 Catania, Italy
• OSTI ID: 5056846
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 55:9; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360106* -- Metals & Alloys-- Radiation Effects
ALLOYS
ALUMINIUM
BACKSCATTERING
CHARGED PARTICLES
COHERENT SCATTERING
COLLISIONS
COPPER
CRYSTAL GROWTH
DIFFRACTION
DIFFUSION
ELEMENTS
ENERGY RANGE
FILMS
GOLD
INTERFACES
INTERMETALLIC COMPOUNDS
ION COLLISIONS
IONS
KEV RANGE
KEV RANGE 10-100
KEV RANGE 100-1000
KRYPTON IONS
METALS
MIXING
PHASE TRANSFORMATIONS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
SCATTERING
SYNTHESIS
THIN FILMS
TRANSITION ELEMENTS
X-RAY DIFFRACTION