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U.S. Department of Energy
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Tracer diffusion in pure and boron-doped Ni/sub 3/Al

Conference ·
OSTI ID:5048711
Diffusion of /sup 63/Ni has been measured in polycrystalline Ni/sub 3/Al as a function of temperature, Al concentration, and boron doping. Volume and grain-boundary diffusion of /sup 60/Co and /sup 68/Ge has been measured in undoped Ni/sub 3/Al. The results are discussed in terms of the defect structure of Ni/sub 3/Al, and it is shown that the vacancy behavior in the bulk is not responsible for the increased segregation of boron to the grain boundaries in hypostoichiometric alloys. 11 refs., 4 figs., 1 tab.
Research Organization:
Illinois Univ., Urbana (USA); Argonne National Lab., IL (USA)
DOE Contract Number:
W-31109-ENG-38; AC02-76ER01198
OSTI ID:
5048711
Report Number(s):
CONF-8710219-3; CONF-8710219-; ON: DE88009945
Country of Publication:
United States
Language:
English