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Thermionic emission and work function of U and UO/sub 2/

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.336242· OSTI ID:5042770

Thermionic emission measurements have been used to determine the work function (phi) of pure and oxidized uranium samples between 1100 and 1300 K; Auger electron spectroscopy (AES) was used to verify the cleanliness and compositions of the samples. It was found that impurities present in ppm amounts in the bulk U segregated to the surface upon heating and had an appreciable effect on the zero-field emission currents as well as the slopes of the Schottky curves obtained at various temperatures. A combination of ion-sputtering and ultrahigh vacuum (UHV) annealing at high temperatures was successful in reducing the total impurity level on the hot surfaces to 5%. At this low concentration of impurities, well-behaved Richardson line plots were obtained with A = 135 A cm/sup -2/ K/sup -2/ and phi = 3.54 eV for pure U and A = 128 A cm/sup -2/ K/sup -2/ and phi = 3.19 eV for UO/sub 2/. The Schottky coefficients for clean U approached their ideal values at fields >400 V/cm.

Research Organization:
University of California, Lawrence Livermore National Laboratory, Livermore, California 94550
OSTI ID:
5042770
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 58:12; ISSN JAPIA
Country of Publication:
United States
Language:
English