The influence of ultraviolet illumination on OH formation in dielectric barrier discharges of Ar/O{sub 2}/H{sub 2}O: The Joshi effect
- Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)
The influence of ultraviolet (UV) illumination on the formation of hydroxyl radicals in dielectric barrier discharges (DBD) in mixtures of Ar/O{sub 2}/H{sub 2}O (79/18/3) will be presented. The UV is provided from a spectrally calibrated, commercial low pressure mercury lamp while the irradiance power of the discharge cell has been previously determined. First, the filamentary character of the DBD is shown by measurement of the relative intensity of the transition OH(A{sup 2}{Sigma}{r_arrow}X{sup 2}{Pi},0-0) with integrated emission spectroscopy as a function of the absolute water concentration at different energy densities coupled into the gas. Then, the influence of UV illumination on the hydroxyl emission is shown by time-gated and time-resolved emission spectroscopy of OH(A{sup 2}{Sigma}{r_arrow}X{sup 2}{Pi}). The results of the combined process is an increased total emission but reduced emission for each microdischarge. This result corresponds to an increase in the number of microdischarges which is supported by the measurement of the microdischarge current. {copyright} {ital 1997 American Institute of Physics.}
- Research Organization:
- Los Alamos National Laboratory
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 503586
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 81; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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