Ion assisted deposition of optical coatings. Doctoral thesis

Technical Report · Fri Aug 01 04:00:00 UTC 1986

OSTI ID:5033676

McNally, J J

The effects on the properties of Ta/sub 2/O/sub 5/, Al/sub 2/O/sub 3/, SiO/sub 2/ and HfO/sub 2/ single- and multi-layer optical coatings deposited using ion-assisted deposition (IAD) were investigated. IAD is a novel deposition technique which utilizes a separate ion source to direct a beam of ions at the growing film. A Kaufman ion source was used to provide a monoenergetic, neutralized beam of oxygen ions independent of the material evaporation process. The optical and physical properties, as well as laser induced damage threshold (LIDT) values, were studied for coatings bombarded with 200, 300, 500 and 1000 eV oxygen ions at values of current density from 0 to 200 microAmp/sq cm. IAD was successfully applied to deposit coatings at low temperature on heavy metal fluoride (HMF) glass substrates. The coatings deposited using IAD were hard and dense. The IAD coatings improved the durability and abrasion resistance of the HMF glass substrates. The results of this investigation show that IAD can be used to improve the optical and physical properties of optical coatings.

• Research Organization: Air Force Inst. of Tech., Wright-Patterson AFB, OH (USA)
• OSTI ID: 5033676
• Report Number(s): AD-A-170672/0/XAB; AFIT/CI/NR-86-77D
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360205* -- Ceramics
Cermets
& Refractories-- Corrosion & Erosion
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ANTIREFLECTION COATINGS
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL REACTIONS
COATINGS
CORROSION
DEPOSITION
ENERGY RANGE
EV RANGE
EV RANGE 100-1000
FILMS
HAFNIUM COMPOUNDS
HAFNIUM OXIDES
IONS
LIGHT SCATTERING
OXIDES
OXYGEN COMPOUNDS
OXYGEN IONS
REFRACTORY METAL COMPOUNDS
SCATTERING
SILICON COMPOUNDS
SILICON OXIDES
STABILITY
TANTALUM COMPOUNDS
TANTALUM OXIDES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS