High-energy lasing of XeBr in an electric discharge

Journal Article · Sat Apr 15 04:00:00 EST 1978 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.90092· OSTI ID:5003211

Sze, R C; Scott, P B

Using an electric discharge as the excitation source we have overcome the problem of Xe/sup +//sub 2/ absorption and have observed lasing at 282 nm in XeBr at the 60-mJ/pulse level. HBr is used as the halogen donor. Simultaneous laser oscillation at 291 nm in Br/sub 2/ has also been observed. The present laser, however, has materials compatibility problems causing short static-fill lifetimes.

• Research Organization: University of California, Los Alamos Scientific Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545
• OSTI ID: 5003211
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 32:8; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ABSORPTION SPECTRA
BROMIDES
BROMINE COMPOUNDS
CHARGED PARTICLES
ELECTRIC DISCHARGES
ENERGY-LEVEL TRANSITIONS
EXCITATION
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
HEAT TREATMENTS
HYDROBROMIC ACID
HYDROGEN COMPOUNDS
INORGANIC ACIDS
IONS
LASERS
MOLECULAR IONS
PERFORMANCE
QUENCHING
RARE GAS COMPOUNDS
SPECTRA
XENON BROMIDES
XENON COMPOUNDS
XENON IONS