High-energy lasing of XeBr in an electric discharge

Journal Article · Sat Apr 15 00:00:00 EST 1978 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.90092· OSTI ID:5003211

Sze, R C; Scott, P B

Using an electric discharge as the excitation source we have overcome the problem of Xe/sup +//sub 2/ absorption and have observed lasing at 282 nm in XeBr at the 60-mJ/pulse level. HBr is used as the halogen donor. Simultaneous laser oscillation at 291 nm in Br/sub 2/ has also been observed. The present laser, however, has materials compatibility problems causing short static-fill lifetimes.

• Research Organization: University of California, Los Alamos Scientific Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545
• OSTI ID: 5003211
• Journal Information: Appl. Phys. Lett.; (United States), Vol. 32:8
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
GAS LASERS
PERFORMANCE
ABSORPTION SPECTRA
ELECTRIC DISCHARGES
EXCITATION
HYDROBROMIC ACID
MOLECULAR IONS
QUENCHING
XENON BROMIDES
XENON IONS
BROMIDES
BROMINE COMPOUNDS
CHARGED PARTICLES
ENERGY-LEVEL TRANSITIONS
HALIDES
HALOGEN COMPOUNDS
HEAT TREATMENTS
HYDROGEN COMPOUNDS
INORGANIC ACIDS
IONS
LASERS
RARE GAS COMPOUNDS
SPECTRA
XENON COMPOUNDS
420300* - Engineering- Lasers- (-1989)