Effect of hydrogen termination on the work of adhesion between rough polycrystalline silicon surfaces
- Berkeley Sensor Actuator Center (BSAC), University of California, Berkeley, CA 94720 (United States)
A novel micromachined test structure has been used to measure the work of adhesion between polycrystalline silicon surfaces. The effects of several surface treatments, including a hydrogen- and an ammonium-fluoride-induced hydrogen termination and a hydrogen peroxide chemical oxidation, have been investigated with these test structures. A reduction in the average apparent work of adhesion by a factor of 2000 has been observed on the NH{sub 4}F-treated surface compared to the oxide-coated surface. By using x-ray photoelectron spectroscopy and atomic force microscopy, the observed reduction is traced to the combined effect of the surface chemistry and topography. This work demonstrates that a hydrophobic, rough surface provides a significant reduction of the apparent work of adhesion in polysilicon micromachined devices. {copyright} {ital 1997 American Institute of Physics.}
- OSTI ID:
- 496397
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 81; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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