Rough surface adhesion in the presence of capillary condensation

DelRio, Frank W.; Dunn, Martin L.; Phinney, Leslie M.; Bourdon, Chris J.; de Boer, Maarten P.

doi:10.1063/1.2723658

Rough surface adhesion in the presence of capillary condensation

Journal Article · Tue Apr 17 00:00:00 EDT 2007 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2723658· OSTI ID:1426973

DelRio, Frank W. ^[1]; Dunn, Martin L. ^[2]; Phinney, Leslie M. ^[3]; Bourdon, Chris J. ^[3]; de Boer, Maarten P. ^[4]

Univ. of California, Berkeley, CA (United States). Department of Chemical Engineering
Univ. of Colorado, Boulder, CO (United States). Department of Mechanical Engineering
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Microscale Science and Technology Department
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). MEMS Core Technologies Department

Capillary condensation of water can have a significant effect on rough surface adhesion. Here, to explore this phenomenon between micromachined surfaces, the authors perform microcantilever experiments as a function of surface roughness and relative humidity (RH). Below a threshold RH, the adhesion is mainly due to van der Waals forces across extensive noncontacting areas. Above the threshold RH, the adhesion jumps due to capillary condensation and increases towards the upper limit of Γ=144mJ/m². Lastly, a detailed model based on the measured surface topography qualitatively agrees with the experimental data only when the topographic correlations between the upper and lower surfaces are considered.

View Accepted Manuscript (DOE)

Research Organization:: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC04-94AL85000

OSTI ID:: 1426973

Report Number(s):: SAND--2007-1239J; 526713

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 16 Vol. 90; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Microelectromechanical Systems and Packaging Lee, Y. C.; Kong, Ming; Zhang, Yadong Materials for Advanced Packaging https://doi.org/10.1007/978-3-319-45098-8_16	book	November 2016
Roughness correction to the Casimir force at short separations: Contact distance and extreme value statistics Broer, Wijnand; Palasantzas, George; Knoester, Jasper Physical Review B, Vol. 85, Issue 15 https://doi.org/10.1103/physrevb.85.155410	journal	April 2012
Mechanics of Adhered, Pressurized Graphene Blisters Boddeti, Narasimha G.; Koenig, Steven P.; Long, Rong Journal of Applied Mechanics, Vol. 80, Issue 4 https://doi.org/10.1115/1.4024255	journal	May 2013
Optical Properties and Kinetic Roughening Influence on Dispersive Casimir and van der Waals Forces Palasantzas, G.; Svetovoy, V. B.; Van Zwol, P. J. International Journal of Modern Physics B, Vol. 24, Issue 31 https://doi.org/10.1142/s0217979210057456	journal	December 2010
Roughness correction to the Casimir force at short separations: Contact distance and extreme value statistics Broer, Wijnand; Palasantzas, George; Knoester, Jasper arXiv https://doi.org/10.48550/arxiv.1203.6304	text	January 2012
Mechanics of Adhered, Pressurized Graphene Blisters Boddeti, Narasimha G.; Koenig, Steven P.; Long, Rong arXiv https://doi.org/10.48550/arxiv.1304.1011	text	January 2013

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