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Enhanced plasma radiation source: Tandem-puff, pinch-on-wire plasma

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.365036· OSTI ID:496393
; ; ; ; ; ;  [1]
  1. Maxwell Laboratories, Inc., Balboa Division, San Diego, California 92123 (United States)

We describe experiments for a neon tandem-puff Z pinch modified with a small-diameter, high-Z wire target (i.e., pinch-on-wire). The radiative yield for photon energies in the range of 1{endash}100 keV is measured. With a copper-wire target the integral yield (J) between 0.9 and 1.5 keV increases by a factor of 1.5 compared to the pinch without a target; the yield is unchanged or slightly increased for higher-Z wires. The high-energy integral yield, above 6 keV, increases by a factor of 2 or more with a copper target and as much as a factor of 5 with a tungsten target. This behavior cannot be accounted for by simple hydrodynamic compression of a hot plasma and suggests yield enhancement by a nonthermal mechanism. {copyright} {ital 1997 American Institute of Physics.}

OSTI ID:
496393
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 81; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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