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Title: Domain boundaries in epitaxial wurtzite GaN

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.118520· OSTI ID:495231
; ;  [1]; ;  [2]
  1. Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ (United Kingdom)
  2. Department of Physics, University of Nottingham, University Park, Nottingham, NG7 2RD (United Kingdom)

Double positioning boundaries on {l_brace}1{bar 2}10{r_brace} and {l_brace}1{bar 1}00{r_brace} planes in wurtzite GaN epilayer grown by molecular beam epitaxy on {l_brace}{bar 1}{bar 1}{bar 1}{r_brace}B GaP are described. Transmission electron microscopy observations demonstrate that the {l_brace}1{bar 2}10{r_brace} boundary extending a short distance along the c axis is characterized by a displacement of 1/2{l_angle}10{bar 1}1{r_angle} and is associated with single growth faults in the basal plane. This boundary forms as a consequence of island coalescence. Conversely, the {l_brace}1{bar 1}00{r_brace} boundary originates at the epilayer/substrate interface and runs through the whole epilayer, while {bold g.R} analysis combined with high resolution electron microscopy suggests a displacement of 1/3n{l_angle}11{bar 2}0{r_angle} (n{gt}3) in the basal plane with an additional shift along {l_angle}0001{r_angle} of 1/n{l_angle}0001{r_angle}(n{gt}3). {copyright} {ital 1997 American Institute of Physics.}

OSTI ID:
495231
Journal Information:
Applied Physics Letters, Vol. 70, Issue 10; Other Information: PBD: Mar 1997
Country of Publication:
United States
Language:
English