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Growth defects in GaN films on 6H{endash}SiC substrates

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.116279· OSTI ID:283789
; ; ;  [1]; ;  [2]
  1. Department of Materials Science and Engineering, Case Western Reserve University, Cleveland, Ohio 44106-7204 (United States)
  2. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7907 (United States)

Lattice defects in GaN epilayers grown on 6H{endash}SiC(0001) by metalorganic vapor phase epitaxy (MOVPE) have been characterized by transmission electron microscopy (TEM). The predominant defects in the film were threading dislocations and half-loops with Burgers vectors 1/3{l_angle}11{bar 2}0{r_angle}, [0001], and 1/3{l_angle}11{bar 2}3{r_angle}. Planar faults were also observed in the film that are thought to be inversion domain boundaries (IDBs). {copyright} {ital 1996 American Institute of Physics.}

DOE Contract Number:
FG02-93ER45496
OSTI ID:
283789
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 19 Vol. 68; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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