ALS-N - A candidate for a next-generation synchrontron light-source

Conference · Thu May 01 04:00:00 EDT 1997

OSTI ID:489610

Jackson, A; Byrd, J; Decking, W ^[1]

---

1. and others

Judging from the experiments currently being pursued at the ALS, there is already a compelling case to be made for considering a future synchrotron radiation source that has a higher beam brightness than the third-generation facilities. For example, a large, and growing fraction of the ALS scientific program is based on soft x-ray microscopy experiments in materials science. Currently these experiments use high-brightness undulator radiation, on beam lines that are already oversubscribed. Dedicated beam lines from bend magnet sources would be useful for these techniques if the source brightness could be pushed to {approx}2{circ}10{sup 16} photons/(s {circ} mm{sup 2} {circ} mrad{sup 2} {circ} 0.1%b.w.), i.e., a factor of 20-100 higher (depending on wavelength), than currently available at the ALS. Another growing class of experiments uses microfocused beams for microanalysis, microdiffraction, microEXAFS, microXPS, and microNEXAFS. These are classic brightness experiments, but even at the high ALS brightnesses, require long exposure times. Finally there is a requirement to get to {approx}2 keV in the fundamental peak of the undulator spectrum, to access most transition- metal L-edges, and the rare-earth M-edges. This could be achieved with a machine energy of 2.5-3.0 GeV. An alternative strategy is to go to smaller gaps with a shorter period undulator - which is compatible with lower emittance beams.

• Research Organization: Lawrence Berkeley Lab., CA (United States)
• Sponsoring Organization: USDOE Office of Energy Research, Washington, DC (United States)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 489610
• Report Number(s): LBNL--39799; CONF-970503--39; ON: DE97006565
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
BEAM EMITTANCE
BEAM LUMINOSITY
DESIGN