Formation of thin polymer dielectric films by ultraviolet irradiation of surfaces in contact with monomer vapor
The results of an investigation on the process of thin polymer dielectric film formation by uv irradiation, particularly with respect to films derived from the monomers acrolein (CH/sub 2/ = CH-CHO), methyl methacrylate (CH/ sub 2/ C(CH/sub 3/)- COOCH/sub 3/), and divinylbenzene (CH/sub 2/ = CH-- C/sub 6/ H/sub CH = CH/sub 2/). Formation of the polymer film was studied by two different methods. The rate of film deposition is proportional to the partial pressure of monomer up to several mm Hg, and then approaches a constant value. The dielectric constant of the film is approximately that of the bulk polymer, but the dissipation factor is somewhat higher and tends to increase with increasing film thickness. (P.C.H.)
- Research Organization:
- International Business Machines Corp., Yorktown Heights, NY (United States)
- Sponsoring Organization:
- Sponsor not identified
- NSA Number:
- NSA-17-032695
- OSTI ID:
- 4875476
- Report Number(s):
- CONF-57--2; AED-Conf--63-031-8
- Country of Publication:
- United States
- Language:
- English
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