METHOD OF FORMING TANTALUM SILICIDE ON TANTALUM SURFACES
Patent
·
OSTI ID:4833626
A method is described for forming a non-corrosive silicide coating on tantalum. The coating is made through the heating of trirhenium silicides in contact with the tantalum object to approximately 1400 deg C at which temperature trirhenium silicide decomposes into rhenium and gaseous silicons. The silicon vapor reacts with the tantalum surface to form a tantalum silicide layer approximately 10 microns thick. (AEC)
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-15-031162
- Assignee:
- U.S. Atomic Energy Commission
- Patent Number(s):
- US 3002852
- OSTI ID:
- 4833626
- Resource Relation:
- Other Information: Orig. Receipt Date: 31-DEC-61
- Country of Publication:
- United States
- Language:
- English
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