FORMATION OF LOCALIZED PLASMAS IN PULSED MICROWAVE DISCHARGE

Journal Article · Mon Jan 01 04:00:00 EST 1962 · J. Phys. Soc. Japan

DOI:https://doi.org/10.1143/JPSJ.17.250· OSTI ID:4791999

Fukui, S; Hayakawa, S; Nukushina, H; Tsukishima, T

Discharge characteristlcs ln Ne-Ar mixtures were studied. The Penning effect is discussed. At low field strengths, most of the electrons were produced by inter actions of metastable Ne atoms with Ar atoms. This process was too slow to account for the fast discharge buildup observed. At high field strengths, electron energies were so high that direct ionization became more effective. When the proportion of Ar was further increased, electron mean energy decreased; the electron mean free path is much shorter in Ar than in Ne. Electron energy distributions were considered as functions of E/P. A plot of breakdown field strength versus Ar content is presented. (L.N.N.)

• Research Organization: Nagoya Univ.,Japan
• Sponsoring Organization: USDOE
• NSA Number: NSA-16-011098
• OSTI ID: 4791999
• Journal Information: J. Phys. Soc. Japan, Journal Name: J. Phys. Soc. Japan Vol. Vol: 17
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

ARGON
ATOMS
BREAKDOWN
CROSS SECTIONS
DIAGRAMS
ELECTRIC DISCHARGES
ELECTRIC FIELDS
ELECTRIC POTENTIAL
ELECTRONS
ENERGY
ENERGY LEVELS
ENERGY RANGE
EXCITATION
IMPURITIES
INTERACTIONS
IONIZATION
MEAN FREE PATH
MEASURED VALUES
METASTABLE STATES
MICROWAVES
MIXING
NEON
PENNING EFFECT
PHYSICS
PLASMA
PRESSURE
PULSES
SCATTERING
SPECTRA
VARIATIONS