Pulsed laser deposition of titanium-carbonitride thin films
- Wright Labs./Materials Directorate, Wright-Patterson AFB, OH (United States)
- Univ. of Dayton, OH (United States). Research Inst.
The goal of this research program is to determine whether pulsed laser deposition is an effective alternative method for growing TiCN thin films. Pulsed laser deposition (PLD) is chosen because of its well-documented capability for growing uniform, stoichiometric films in ultra-high vacuum or gaseous environments. Processing of thin films by PLD is also achieved at relatively low temperatures compared with CVD processing. Given these attributes, the primary objectives in this article are to determine whether nitrogen may be readily incorporated into films resulting from the laser-ablation of TiC in an N{sub 2} environment, determine what effect nitrogen has on mechanical properties, and determine whether nitrogen incorporation is strongly influenced by processes unrelated to laser deposition (e.g., thermally-activated surface reactions).
- OSTI ID:
- 474196
- Journal Information:
- Scripta Materialia, Journal Name: Scripta Materialia Journal Issue: 10 Vol. 36; ISSN 1359-6462; ISSN SCMAF7
- Country of Publication:
- United States
- Language:
- English
Similar Records
Modeling of thermal, electronic, hydrodynamic, and dynamic deposition processes for pulsed-laser deposition of thin films
Ultra-high vacuum chemical vapor deposition and in situ characterization of titanium oxide thin films