Sputtering Yields of Single Crystals Bombarded by 1- to 10-keV Ar⁺ Ions

Journal Article · Tue Jan 01 04:00:00 EST 1963 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1729175· OSTI ID:4686642

Magnuson, G. D.; Carlston, C. E.

The sputtering yield S, in atoms/ion, was measured for Cu and Ag single crystals bombarded at normal incidence by 1- to 10-kev Ar⁺ ions. Yields of the three low-index planes (110), (100), and (111) for Cu and Ag crystals were measured as well as that of a Cu (311) plane. In addition a yield curve of a Cu (100) crystal bombarded in a [111] direction was measured. The yields were obtained by a weight loss method using ion beam techniques, The yields are strongly dependent on crystalline orientation showing a steep rise with energy, a maximum, which appears at an energy depending on the plane being bombarded, and a slow decrease with ion energy above the maximum. A simple theory is presented which accounts reasonably well for the energy dependence of the sputtering yield in terms of crystalline opacity and the momentum of the incident ion.

• Research Organization: General Dynamics/Astronautics, San Diego, Calif.
• Sponsoring Organization: USDOE
• NSA Number: NSA-17-041598
• OSTI ID: 4686642
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 34; ISSN JAPIAU; ISSN 0021-8979
• Publisher: American Institute of Physics (AIP)
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
ARGON
ATOMS
COPPER
CRYSTALS
EFFICIENCY
EMISSION
ENERGY RANGE
ION BEAMS
KEV RANGE
LOSSES
MASS
MEASURED VALUES
MOMENTUM
MONOCRYSTALS
SECONDARY EMISSION
SILVER
SPUTTERING
TARGETS